发明名称 High-purity trimethylaluminum and purification method of crude trimethylaluminum
摘要 High-purity trimethylaluminum has the following impurity contents: organosilicon components<=0.5 ppm, chlorine components<=20 ppm, hydrocarbon components<=1,000 ppm, Ca<=0.05 ppm, Fe<=0.05 ppm, Mg<=0.05 ppm, Na<=0.05 ppm, Si (Si components other than the organosilicon components)<=0.07 ppm, Zn<=0.05 ppm, and S<=0.05 ppm. The high-purity trimethylaluminum can be obtained by removing impurities from crude trimethylaluminum through distillation and evaporation.
申请公布号 US7179931(B2) 申请公布日期 2007.02.20
申请号 US20050154535 申请日期 2005.06.17
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 TSUDERA TAKANOBU;TANAKA SHUJI;IWAI DAISUKE;NISHIWAKI HIROMI;HONMA TAKAYUKI
分类号 C07F5/06 主分类号 C07F5/06
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