| 摘要 |
A projection objective of a microlithographic projection exposure apparatus contains a plurality of optical elements (P, S, L1 to L8, L13, L19) arranged in N >- 2 successive sections A1 to AN of the projection objective (10) which are separated from one another by pupil planes (El, E3) or intermediate image planes (E2). According to the invention, in order to correct a wavefront deformation, at least two optical elements each have an optically active surface locally reprocessed aspherically. A first optical element is in this case arranged in one section Aj, j = 1.. .N and a second optical element is arranged in another section Ak, k = 1...N, the magnitude difference lk - jl being an odd number. ® KIPO & WIPO 2007 |
