Method and apparatus for modeling multivariate parameters having constants and same pattern and method of fabricating semiconductor using the same

摘要

Example embodiments of the present invention relate to a multivariate modeling method, a method of fabricating semiconductors using a semiconductor fabricating facility and a multivariate model creating apparatus. Other example embodiments of the present invention relate to a method and apparatus for modeling multivariate parameters having constants and the same pattern and a semiconductor fabricating method of detecting whether a semiconductor fabricating facility is operating normally using the multivariate modeling method. In a multivariate modeling method according to example embodiments of the present invention, data of parameters are selected during a modeling period. Averages and standard deviations of the data of the parameters may be calculated. It may be determined whether the data of the parameters contain non-random data. If the data of the parameters do not contain non-random data, the data may be normalized using the averages and standard deviations of the data of the parameters. If the data of the parameters contain non-random data, random data may be added to data of a parameter containing the constants or the data similar to constants among the parameters. The data may be normalized by calculating an artificial standard deviation of the random data added data of the parameter. Characteristic values of the parameters may be analyzed from the normalized data. A model may be created based on the characteristic values.