发明名称 INFORMATION DISPLAY SYSTEM
摘要 <P>PROBLEM TO BE SOLVED: To provide an information display system which evaluates the formed state of device structures which are formed process by process in a plurality of layers so as to be superposed on top of each other in each of a plurality of different zone areas on an object, which can improve a yield of device manufacturing processes. <P>SOLUTION: In the main window 650 of an evaluation application; averages of superposition errors, averages of line widths, etc. corresponding to a plurality of processes A-J are displayed on a graph 652, averages of superposition errors, averages of line widths, etc. corresponding to a plurality of wafers 1-10 in a lot are displayed on a graph 653, averages of superposition errors, and averages of line widths, etc. corresponding to a plurality of shot regions 1-10 are displayed on a graph 654. By specifying a process, wafer, shot region, and its coordinates by using these graphs and pulldown menus 657, 659, and 661; the specified device structure can be shown as a graphical image. The actually measured superposition error and line width of that portion are reflected in this graphical image. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007042701(A) 申请公布日期 2007.02.15
申请号 JP20050222398 申请日期 2005.08.01
申请人 NIKON CORP 发明人 OKITA SHINICHI
分类号 H01L21/027;G03F7/20;H01L21/02 主分类号 H01L21/027
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