| 摘要 |
An exposure apparatus includes a first structure which supports a projection unit which projects an exposure beam onto a substrate, a first anti-vibration supporting leg which includes a first actuator and supports the first structure, a second structure which supports a substrate stage which aligns the substrate, a second anti-vibration supporting leg which includes a second actuator and supports the second structure, and a control unit which controls at least one of the first actuator and the second actuator to reduce the relative displacement between the first structure and the second structure.
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