发明名称 METHOD FOR MODIFYING SURFACE OF SUBSTRATE, SEMICONDUCTOR DEVICE, AND MANUFACTURING METHOD THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To improve moistureproof reliability by making adhesiveness between an insulating film, component made of copper and a sealing resin firm. <P>SOLUTION: The insulating film 40 is formed on a substrate 30 selected from a group containing a BT resin-based substrate and an epoxy resin-based substrate. On the insulating film, a copper wiring including a wiring 42 and a copper post are formed. To the exposed surfaces of the insulating film, the copper wiring, and the copper post provided on the semiconductor substrate; plasma processing is performed using nitride-based gas. A sealing part 44 covering and sealing the exposed surface is formed. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007043084(A) 申请公布日期 2007.02.15
申请号 JP20060135274 申请日期 2006.05.15
申请人 OKI ELECTRIC IND CO LTD 发明人 TANAKA YASUO
分类号 H01L21/56;H01L21/3205;H01L21/60;H01L23/12;H01L23/52;H05K3/38 主分类号 H01L21/56
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