| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for achieving best throughput while suppressing degradation of beam resolution. SOLUTION: A writing apparatus comprises a writing data processing circuit 310 for inputting the pattern data of a pattern written by shots of an electron beam 200, and selecting a current density of the electron beam 200 being shot and a maximal shot size thereof corresponding to the inputted pattern data; and a writing unit 150 for creating the electron beam 200 with the selected current density, shaping the created electron beam 200 into a shot size less than or equal to the maximal shot size for each shot, shooting the shaped electron beam 200 onto a workpiece, and writing the pattern. COPYRIGHT: (C)2007,JPO&INPIT
|
