发明名称 |
METHOD AND APPARATUS FOR PROJECTION PRINTING |
摘要 |
A method, apparatus for and a device manufactured by the same, for printing a microlithographic pattern with high fidelity and resolution using simultaneously optimized illuminator and pupil filters having semi-continuous transmission profiles. The optimization can be further improved if the illuminator and pupil filters are polarization selective. The optimization method becomes a linear programming problem and uses a set of relevant features in the merit function. With a suitably chosen merit function and a representative feature set both neutral printing without long-range proximity effects and good resolution of small features can be achieved. With only short-range proximity effects OPC correction is simple and can be done in real time using a perturbation method.
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申请公布号 |
WO2007018464(A2) |
申请公布日期 |
2007.02.15 |
申请号 |
WO2006SE00932 |
申请日期 |
2006.08.08 |
申请人 |
MICRONIC LASER SYSTEMS AB;SANDSTROEM, TORBJOERN;IVONIN, IGOR |
发明人 |
SANDSTROEM, TORBJOERN;IVONIN, IGOR |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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