| 摘要 |
PROBLEM TO BE SOLVED: To easily measure a film thickness of an oxide film in a short period of time. SOLUTION: This film thickness measuring method finds the film thickness of the oxide film of metal or alloy, or a thin film thereof, using only a phase difference▵measured ellipsometrically, based on a preliminarily prepared relation between the oxide film of metal or alloy, or the thin film thereof, and the phase difference▵measured ellipsometrically. This substrate treatment device has a film thickness measuring instrument for finding the film thickness of the oxide film of metal or alloy, or the thin film thereof, using only the phase difference▵measured ellipsometrically, based on the preliminarily prepared relation between the oxide film of metal or alloy, or the thin film thereof and the phase difference▵measured ellipsometrically. COPYRIGHT: (C)2007,JPO&INPIT
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