| 发明名称 |
A METHOD OF PRODUCING A POROUS SEMICONDUCTOR FILM ON A SUBSTRATE |
| 摘要 |
<p>The invention relates to a method of producing a porous semiconductor film and the film resulting from such production. It furthermore relates to an electronic device incorporating such film and to potential uses of such film.</p> |
| 申请公布号 |
EP1751780(A1) |
申请公布日期 |
2007.02.14 |
| 申请号 |
EP20050700979 |
申请日期 |
2005.01.17 |
| 申请人 |
SONY INTERNATIONAL (EUROPE) GMBH |
发明人 |
DUERR, MICHAEL;SCHMID, ANDREAS;NELLES, GABRIELE;YASUDA, AKIO |
| 分类号 |
H01G9/20;H01L31/18;H01L51/40 |
主分类号 |
H01G9/20 |
| 代理机构 |
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