发明名称 Fuse structure for a semiconductor device
摘要 A fuse structure for a semiconductor device is provided. The fuse structure includes a fuse layer between the upper and lower insulating layers. The fuse layer is connected to the other metal layers through the via plugs. The fuse layer includes at least two separate blocks and at least a connecting block. For the current flowing through the separated blocks in a zig-zag path, of the fuse structure provides at least a fusing point or more than one fusing points. In this way, the negative impact of the single failed fuse can be reduced, thus increasing the reliability of the fuse structure. Also the damage to the devices adjacent to the fuse due to the heat generated by the current can be prevented because when the heat generated during the fuse blowing process will be conducted to the adjacent blocks to facilitate heat dissipation.
申请公布号 US7176551(B2) 申请公布日期 2007.02.13
申请号 US20040850201 申请日期 2004.05.19
申请人 UNITED MICROELECTRONICS CORP. 发明人 CHENG CHUN-WEN;LIANG CHIA-WEN;LEE RICHARD;HSUEH VINCENT
分类号 H01L29/00;H01L23/525 主分类号 H01L29/00
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