发明名称 |
PROCESSING METHOD FOR PHOTOPOLYMERIZABLE PHOTOSENSITIVE MATERIAL |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a developing method by which even in the case of a photopolymerizable photosensitive material requiring edge processing, faulty dissolution at ends and side faces of the support due to pressure fog does not occur in development, accordingly stable development can be performed. <P>SOLUTION: In the developing method for a photosensitive material, a photosensitive material in which side faces of the support has been chamfered (edge-processed) is processed with a developing device having at least one brush roller which rotates in a direction opposite to a transport direction of the photosensitive material. <P>COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2007033777(A) |
申请公布日期 |
2007.02.08 |
申请号 |
JP20050215849 |
申请日期 |
2005.07.26 |
申请人 |
MITSUBISHI PAPER MILLS LTD |
发明人 |
ARAKI YUTAKA;OTSUKA MASAYOSHI |
分类号 |
G03F7/30;G03F7/00;G03F7/038 |
主分类号 |
G03F7/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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