| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for fabricating a nanoadhesive that can meet industrial requirements of mass production and low cost. SOLUTION: The method for fabricating a nanoadhesive includes steps of:(a) preparing a substrate 11 and a transfer stamp 21 in a vacuum environment, the transfer stamp 21 having a transfer face and a nanometer-scale projection pattern 24 on the surface of the transfer face, the nanometer-scale projection pattern 24 comprising a large number of projections 241 and recesses 243, and the substrate 11 having has an etched layer 12; (b) proceeding a deposition step of depositing a photoresist material 26 on either the projections 241 or the recesses 243 of the nanometer-scale projection pattern 24; (c) proceeding a transfer step of bringing the nanometer-scale projection pattern 24 of the transfer stamp 21 into contact with the etchable layer 12 to transfer the photoresist material 26 on the nanometer-scale projection pattern 24 onto the surface of the etchable layer 12; and (d) proceeding an etching step of etching the etchable layer 12 in a part having no deposition of the photoresist material to a predetermined depth. COPYRIGHT: (C)2007,JPO&INPIT |
