发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition excellent in transparency, heat resistance and heat discoloration resistance and having preferable coating property, developing property and storage stability. <P>SOLUTION: The resin composition contains a copolymer [A] containing hydroxyphenyl (meth)acrylate (a1) and an epoxy group-containing unsaturated compound (a2) as polymer components, and a quinonediazide group-containing compound [B]. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007033518(A) 申请公布日期 2007.02.08
申请号 JP20050212661 申请日期 2005.07.22
申请人 SHOWA HIGHPOLYMER CO LTD 发明人 ENDO MITSUO;OGAWA KOSHI;YANAI TAKAYUKI
分类号 G03F7/038;H01L21/027 主分类号 G03F7/038
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