发明名称 EXPOSURE PATTERN FORMATION METHOD
摘要 <P>PROBLEM TO BE SOLVED: To reduce manufacturing costs by enhancing versatility in a light source array, a fiber, and a fiber bundle and simplifying the formation process of an exposure pattern. <P>SOLUTION: An exposure pattern formation method uses the light source array 4 where light sources 8 are placed side by side vertically and horizontally, and the fiber bundle 6, where output side edges of a plurality of fibers 11 in which each of input side edges is optically connected to each of the light sources 8 in a one-to-one relationship are bundled into one and output ends are placed side by side on an end face. In the exposure pattern formation method, each of the input ends of the fibers 11 is optically connected to each of the light sources 8 in a one-to-one relationship randomly, positions of the output ends of the fibers 11 for outputting light when each of the light sources 8 is lit successively are detected successively, the correlation between each of the light sources 8 and each position of the output ends of the fibers 11 is stored, and each of the light sources 8 is lit based on the correspondence, thus forming a desired exposure pattern on the end face of the fiber handle 6. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007036039(A) 申请公布日期 2007.02.08
申请号 JP20050219278 申请日期 2005.07.28
申请人 NANO SYSTEM SOLUTIONS:KK 发明人 YOKOYAMA HIROSHI;HAGA KAZUMI;SAKAI MOTOYUKI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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