| 摘要 |
<P>PROBLEM TO BE SOLVED: To easily and accurately measure wave front of a projection optical system having a large aperture. <P>SOLUTION: The aligner is provided with a projection optical system to the pattern image of a reticle to an object to be exposed, and an interferometer to measure the optical characteristic of the projection optical system. The interferometer is comprised of a mask which is arranged on he object surface of the projection optical system so as to shape the wave front of a light from a light source into an ideal wave front, a detection means to detect the light passing through the projection optical system, and an optical member which is placed between the mask and the projection optical system or between the projection optical system and the detection means. The detection means is configured to especially detect an interference fringe that is formed by interference between a light reflecting on the optical member and a transmitting light transmitting through the optical member. <P>COPYRIGHT: (C)2007,JPO&INPIT |
