发明名称 |
Offset spacers for CMOS transistors |
摘要 |
An offset spacer for CMOS transistors and a method of manufacture is provided. A gate electrode is formed on a substrate, and an offset mask layer is formed over the surface of the gate electrode and the substrate. The offset mask may be formed of an oxide layer and acts as a mask during implanting, such as pocket implants and lightly-doped drain implants. A second implant spacer may be formed on top of the offset mask layer adjacent the gate electrode, and another implant process may be performed to form deeply-doped drain regions.
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申请公布号 |
US2007029608(A1) |
申请公布日期 |
2007.02.08 |
申请号 |
US20050199486 |
申请日期 |
2005.08.08 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
HUANG CHIEN-CHAO |
分类号 |
H01L29/772;H01L21/336;H01L21/8238 |
主分类号 |
H01L29/772 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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