发明名称 Determining dopant content of doped amorphous semiconductor layer on carrier comprises use of spectral ellipsometry and reference Tauc curve
摘要 <p>Determining the dopant content of a doped amorphous semiconductor layer (10) on a carrier (1) comprises preparing a reference Tauc curve relating dopant concentration to the slope (b) of the linear region. The square root of the product of absorption coefficient (alpha ) and photon energy (E) (y axis) is plotted against photon energy and the slope (b) equals delta y/delta (E -Et) where Et is the band gap. The plot is repeated for the dopant layer to be tested using spectral ellipsometry, the slope (b) is found and thus the dopant concentration.</p>
申请公布号 DE102005047105(B3) 申请公布日期 2007.02.08
申请号 DE20051047105 申请日期 2005.09.30
申请人 INFINEON TECHNOLOGIES AG 发明人 SCHMIDT, GERHARD;SCHIFFER, THORSTEN T.;TRATTER, EDGAR
分类号 H01L21/66;G01N21/21;H01L23/29 主分类号 H01L21/66
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