发明名称 |
composition for preparing porous dielectric films |
摘要 |
<p>The present invention provides a composition for preparing porous dielectric thin film containing pore-generating material, said composition comprising gemini detergent, fourth alkylammonate, thermo-stable organic or inorganic matrix precursor, and solvent for dissolving said two solid components. There is also provided an interlayer insulating film having good mechanical property such as hardness, modulus and hydroscopicity, which is required for semiconductor devices.</p> |
申请公布号 |
EP1435369(B1) |
申请公布日期 |
2007.02.07 |
申请号 |
EP20030257179 |
申请日期 |
2003.11.13 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LYU, YI YEOL;KIM, JI MAN;LEE, KWANG HEE;CHANG, SEOK;YIM, JIN HEONG;PARK, JAE GEUN |
分类号 |
C08J5/22;C08J9/26;C08G77/04;C09D5/25;C09D103/00;C09D183/04;H01L21/312;H01L21/316;H01L21/768 |
主分类号 |
C08J5/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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