发明名称 |
Pattern forming method and wiring pattern forming method, and electro-optic device and electronic equipment |
摘要 |
To provide a pattern forming method enabling a thin film to be patterned with high precision by easy and low cost techniques. A thin film 2 is provided on a base material 1 containing a sublimable dyestuff, light is irradiated to the base material 1 , and heat generated by the light irradiation sublimates the sublimable dyestuff in a desired region, thereby removing the thin film 2 corresponding to an irradiation region where the light is irradiated to thereby pattern this thin film 2. |
申请公布号 |
US7172912(B2) |
申请公布日期 |
2007.02.06 |
申请号 |
US20040898344 |
申请日期 |
2004.07.26 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
TOYODA NAOYUKI |
分类号 |
G03F7/004;H01L21/00;B05D3/06;B05D3/12;B41M5/24;B41M5/46;G02B5/20;G02F1/1335;G02F1/1343;G03C8/00;G03F7/00;G03F7/36;H01L21/20;H01L21/302;H01L21/461;H01L51/00;H01L51/50;H05B33/10;H05B33/14;H05B33/26;H05K3/06;H05K3/14 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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