| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an economic exposure apparatus which demonstrates a superior exposure properties by preventing a decline in throughput and resolution, by preventing deterioration of reflection and the ununiformity in illuminance of an optical element. <P>SOLUTION: The exposure apparatus includes an illumination optical system which illuminates pattern by exposure light from a light source which generates exposure light using a plasma, and transfers the pattern onto an exposed material. The exposure apparatus includes a measuring device for measuring the quantity of contaminant which flows from the light source to the illumination optical system, and/or for detecting the kind of the contaminant; and a decision portion which decides the performance of the light source, based on the measurement results and/or the detection results of the measuring device. <P>COPYRIGHT: (C)2007,JPO&INPIT |
