发明名称 |
PHOTOCURABLE RESIN COMPOSITION, PHOTOCURABLE COLORED RESIN COMPOSITION AND COLOR FILTER |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photocurable resin composition which forms a photocured film excellent in smoothness without causing defects in an exposed portion during development even in the case of small exposure energy, and in which an unexposed portion generates neither undissolved matter nor residue on development and exhibits good developability, and a color filter produced by photolithography using the photocurable resin composition. <P>SOLUTION: The photocurable resin composition contains an alkali-soluble resin, a photopolymerizable compound and a photopolymerization initiator, wherein the alkali-soluble resin has a side chain in which a polymerizable double bond is present in a position at least 17 carbon atoms away from its molecular backbone. The color filter produced by photolithography using the photocurable resin composition is also provided. <P>COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2007025535(A) |
申请公布日期 |
2007.02.01 |
申请号 |
JP20050211105 |
申请日期 |
2005.07.21 |
申请人 |
FUJIFILM ELECTRONIC MATERIALS CO LTD |
发明人 |
DAN MASAYUKI;OKABE KOTARO |
分类号 |
G03F7/038;C08F290/12;G02B5/20;G03F7/004 |
主分类号 |
G03F7/038 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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