发明名称 SURFACE INSPECTION DEVICE AND SURFACE INSPECTION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a surface inspection device or a surface inspection method for accurately detecting the height of projection parts formed on a substrate, even when the substrate has a warpages, undulations, or thickness irregularities. SOLUTION: This surface inspection device for inspecting the height of the projection parts, juxtaposed along one direction of a surface of the substrate is provided with a light projection optical system 4 for projecting linear light, extending along the one direction onto the surface of the substrate; a CCD 12 for alternately receiving an on-substrate reflected beam and an on-projection part reflected beam concurrently with its relative movement as to the substrate in the one direction; and a control part 14 for allotting a light-receiving part of the CCD 12 to an ROI<SB>1</SB>and an ROI<SB>2</SB>, and finding the height of the projection parts, based on a distance between each other's peak arising positions of the on-substrate reflected beam received by the ROI<SB>1</SB>and the on-projection part reflected beam received by the ROI<SB>2</SB>. The control part 14 finds the bias direction and bias amount at the peak arising position of either of the reflected beams, and re-allots the ROI<SB>1</SB>and the ROI<SB>2</SB>so as to eliminate the bias. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007024623(A) 申请公布日期 2007.02.01
申请号 JP20050205609 申请日期 2005.07.14
申请人 NANO SYSTEM SOLUTIONS:KK 发明人 KINO SATORU
分类号 G01B11/02;G01N21/956;H01L21/60;H01L21/66 主分类号 G01B11/02
代理机构 代理人
主权项
地址