| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an EUV aligner or an aligner capable of performing exposure using an optical element under high vacuum atmosphere. <P>SOLUTION: The aligner comprises a light source emitting pulse light, an illumination optical system for condensing light from the light source and illuminating an original plate, a projection optical system for introducing light from the original plate to an exposed article, a stage for mounting the exposed article, a means for ionizing contaminants floating in the space for passing light, and a means for discharging ionized contaminants wherein the discharging means is connected with a voltage source or the discharging means has a cooling means. <P>COPYRIGHT: (C)2007,JPO&INPIT |
