| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a resist pattern with a large level difference. <P>SOLUTION: First, (a) a positive resist 2 is applied on a substrate (optical substrate) 1 made of quartz or glass; (b) the resist 2 is exposed by using a gray scale mask 2, wherein the dose of exposure light is controlled to a range not to induce foaming in the resist 2; (c) the resist 2 is developed; then (d) the same gray scale mask 4 as the above mask is prepared to again expose the resist 2, wherein the dose of exposure light is also controlled to a range not to induce foaming in the resist 2; and (e) the resist 2 is again developed. Thus, a microlens comprising the resist 2 having a large SAG amount as a target is formed. <P>COPYRIGHT: (C)2007,JPO&INPIT |
