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发明名称
SEMICONDUCTOR WAFER THINNING
摘要
The invention concerns a method for thinning a first semiconductor wafer (1) from a first side (12), which consists in applying, on the second side of the first wafer, a second wafer (3) with an interposed photoresist layer (2).
申请公布号
WO2006054024(A3)
申请公布日期
2007.02.01
申请号
WO2005FR50959
申请日期
2005.11.17
申请人
STMICROELECTRONICS SA;HERNANDEZ, CAROLINE
发明人
HERNANDEZ, CAROLINE
分类号
H01L21/68;H01L21/78
主分类号
H01L21/68
代理机构
代理人
主权项
地址
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