发明名称 SEMICONDUCTOR WAFER THINNING
摘要 The invention concerns a method for thinning a first semiconductor wafer (1) from a first side (12), which consists in applying, on the second side of the first wafer, a second wafer (3) with an interposed photoresist layer (2).
申请公布号 WO2006054024(A3) 申请公布日期 2007.02.01
申请号 WO2005FR50959 申请日期 2005.11.17
申请人 STMICROELECTRONICS SA;HERNANDEZ, CAROLINE 发明人 HERNANDEZ, CAROLINE
分类号 H01L21/68;H01L21/78 主分类号 H01L21/68
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