发明名称 |
Mask for manufacturing a display substrate capable of improving image quality |
摘要 |
A mask for forming a display substrate capable of improving color reproducibility by avoiding color spots and color shifts is presented. The mask includes a first sub-mask, a second sub-mask, a first overlapping portion and a second overlapping portion. The first sub-mask includes color reticles to form color pixels in a first active region of a display substrate. The second sub-mask includes color reticles to form color pixels in a second active region of the display substrate. The first overlapping portion is on a portion of the first sub-mask that overlaps the second sub-mask. The color reticles in the first overlapping portion are arranged at a different density from the rest of the first sub-mask. The second overlapping portion is on a portion of the second sub-mask that overlaps the first sub-mask. The color reticles in the second overlapping portion are arranged at a substantially same density as the first overlapping portion. Therefore, image display quality is improved. |
申请公布号 |
US2007026586(A1) |
申请公布日期 |
2007.02.01 |
申请号 |
US20060494085 |
申请日期 |
2006.07.26 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM HYUK-JIN;PARK MIN-WOOK;KIM IN-WOO |
分类号 |
H01L21/84 |
主分类号 |
H01L21/84 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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