发明名称 Mask for manufacturing a display substrate capable of improving image quality
摘要 A mask for forming a display substrate capable of improving color reproducibility by avoiding color spots and color shifts is presented. The mask includes a first sub-mask, a second sub-mask, a first overlapping portion and a second overlapping portion. The first sub-mask includes color reticles to form color pixels in a first active region of a display substrate. The second sub-mask includes color reticles to form color pixels in a second active region of the display substrate. The first overlapping portion is on a portion of the first sub-mask that overlaps the second sub-mask. The color reticles in the first overlapping portion are arranged at a different density from the rest of the first sub-mask. The second overlapping portion is on a portion of the second sub-mask that overlaps the first sub-mask. The color reticles in the second overlapping portion are arranged at a substantially same density as the first overlapping portion. Therefore, image display quality is improved.
申请公布号 US2007026586(A1) 申请公布日期 2007.02.01
申请号 US20060494085 申请日期 2006.07.26
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM HYUK-JIN;PARK MIN-WOOK;KIM IN-WOO
分类号 H01L21/84 主分类号 H01L21/84
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