发明名称 |
Verfahren zur Unterstützung der Maskenherstellung, Verfahren zur Bereitstellung von Maskenrohlingen und Verfahren zur Handhabung von Maskenrohlingen |
摘要 |
<p>A mask blank is provided by forming a plurality of films, including at least a thin film to be a transfer pattern, on a board. At the time of patterning a resist film of the mask blank according to pattern data, film information to check with a pattern is obtained for each of a plurality of the films.</p> |
申请公布号 |
DE112005000548(T5) |
申请公布日期 |
2007.02.01 |
申请号 |
DE20051100548 |
申请日期 |
2005.03.07 |
申请人 |
HOYA CORP. |
发明人 |
ISHIDA, HIROYUKI;AIYAMA, TAMIYA;MARUYAMA, KOICHI |
分类号 |
G03F1/08;H01L21/027 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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