DRY ETCHING APPARATUS FOR FABRICATING SEMICONDUCTOR DEVICE

摘要

Dry etching equipment for fabricating a semiconductor device is provided to prevent the inside of a vapor supply tank from being contaminated by coating the inside of the vapor supply tank. An etch gas supplying tank in which etch gas is stored supplies etch gas to a process chamber. A vapor supply tank(150) whose inside is coated with a corrosion preventing material supplies vapor to the process chamber wherein the vapor is stored in the vapor supply tank. The coating material(151) in the vapor supply tank includes ceramic or teflon.