发明名称 METHOD OF MINIMAL WAFER SUPPORT ON BEVEL EDGE OF WAFER
摘要 The present invention generally provides a method and apparatus for supporting and transferring a substrate in and out a wet cleaning chamber with minimal contact. One embodiment of the present invention provides an apparatus for support and transferring a substrate. The apparatus comprises a frame connected with an actuator configured to move the frame, two posts extending from the frame, two end effecter bodies, each of the two end effecter bodies formed on a respective one of the two posts, wherein the frame and the end effecter bodies are positioned on opposite ends of the two posts, and two contact assemblies extending from each of the two end effecter bodies, wherein the two contact assemblies are configured to receive and support the substrate near a bevel edge.
申请公布号 US2007026602(A1) 申请公布日期 2007.02.01
申请号 US20060460054 申请日期 2006.07.26
申请人 MIMKEN VICTOR 发明人 MIMKEN VICTOR
分类号 H01L21/8242 主分类号 H01L21/8242
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