| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a signal processing technique having high accuracy of position detection. <P>SOLUTION: An exposure apparatus for exposing a substrate via an original plate has a detecting means for detecting a reflection light from an object, and a signal processing means for obtaining the position of the object on the basis of the detection signal detected by the detecting means. The detection signal comprises N pieces of constituents. The signal processing means uses M pieces of orthogonal base vector previously obtained, the M being smaller than the number N, to obtain similarities with respect to a plurality of different relative positions between the detection signal and the orthogonal base vector, and signal processing means obtains the position of the object on the basis of the plurality of obtained similarities. <P>COPYRIGHT: (C)2007,JPO&INPIT |
