摘要 |
A vapor deposition apparatus is provided to reduce a heat radiating region by protruding a nozzle bar from an evaporator tube so that the evaporator tube to the nozzle bar is heat-insulated. The surface of a material to be vaporized is extended in a direction almost perpendicular to a gravity direction in an evaporator supply source. An evaporator chamber(17) has a longitudinal axis parallel with the gravity direction, positioned on the evaporator supply source. The evaporator chamber includes a nozzle bar(18) in which several emission openings arranged in a line are disposed. The emission openings of the nozzle bar are vertically formed with respect to the gravity direction. A nozzle bar region having the emission openings protrudes to a substrate to be coated in the evaporator chamber. The evaporator chamber can be of a cylindrical tube or a quadrangular tube. The evaporator chamber is surrounded by a heat insulation layer(26) extended to the protruding nozzle bar.
|