Device for etching layers on semiconductor wafers, uses spectrometer for measurement of etching medium concentration

摘要

A device with etching equipment for etching complete layers or parts of layers to be removed from semiconductor wafers (5) with a liquid etching medium comprises a spectrometer (13) for measuring the concentration of the etching medium. Independent claims are also included for the following. (1) etching complete layers or parts of layers to be removed from semiconductor wafers; and (2) the application of a spectrometer in an etching device.