| 摘要 |
<p>A manufacturing method of a substrate for a mask blank, and a manufacturing method of the mask blank and a mask are provided to effectively polish a large-sized substrate with a big weight by reducing polishing resistance. A polishing cloth(2) is attached to a surface plate(3). A substrate for a mask blank is moved with respect to the surface plate, while a predetermined weight is applied on the substrate. A polishing solution is supplied to a contact surface between the polishing clock and the substrate. The surface plate includes a groove(3a) at an opposite side to a polishing cloth attachment surface. A cross-section of the groove is a curve shape on at least an aperture periphery. The polishing cloth is attached according to the polishing cloth attachment surface and a shape of the groove. The surface plate is used for polishing the substrate for the mask blank.</p> |
