发明名称 |
FILM DEPOSITING METHOD, FILM FORMING METHOD, METHOD OF FORMING FILM DEPOSITING DEVICE, FILM FORMING DEVICE, ELECTRO-OPTICAL DEVICE MANUFACTURING METHOD, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC APPRATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a film forming method which is capable of forming a film excellent in cracking resistant properties. SOLUTION: The film forming method comprises processes of inserting a substrate into a furnace kept at a prescribed temperature, heating the inside of the furnace, depositing a film on the substrate inside the furnace, and cooling off the inside of the furnace at a cooling rate slower than a heating rate in a heating process. COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2007019131(A) |
申请公布日期 |
2007.01.25 |
申请号 |
JP20050197079 |
申请日期 |
2005.07.06 |
申请人 |
SEIKO EPSON CORP |
发明人 |
YAMAZAKI RYOSUKE |
分类号 |
H01L21/316;G02F1/1368;H01L21/31;H01L29/786 |
主分类号 |
H01L21/316 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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