| 摘要 |
measuring method for measuring a position of the surface of a substrate, wherein measurement light is obliquely projected onto the substrate surface and the measurement light on that surface is detected and wherein, on the basis of a position of the detected measurement light and a predetected offset, the position of the substrate surface with respect to a direction of an optical axis of the projection optical system is measured, the method including: memorizing, as a first position, a position of a measurement point on the substrate while using, as a reference, a reference mark provided on a substrate stage configured to hold and move the substrate; measuring, in accordance with information concerning the memorized first position and in relation to the measurement point, the position of the measurement light as a first measurement position; rotating the substrate by 180 deg. in a plane perpendicular to the optical axis; memorizing, as a second position, a position of the measurement point on the rotated substrate with reference to the reference mark; measuring, in accordance with information concerning the memorized second position and in relation to the measurement point, the position of the measurement light as a second measurement position; and detecting the offset at the measurement point, on the basis of the first measurement position and the second measurement position.
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