发明名称 SCHLEIFGEGENSTAND MIT FENSTERSYSTEM SOWIE VERFAHREN ZUM POLIEREN VON WAFERN
摘要 <p>A method of making an abrasive article for wafer planarization, the method comprising providing an abrasive coating composition, providing a backing having a first major surface, said surface having a first portion and a second portion, and bringing the backing into contact with the abrasive coating composition, so that the abrasive coating composition substantially adheres only to the first portion of the backing.</p>
申请公布号 DE60118171(T2) 申请公布日期 2007.01.25
申请号 DE2001618171T 申请日期 2001.04.11
申请人 3M INNOVATIVE PROPERTIES CO. 发明人 MUILENBURG, J.;KIM, YONG;FIZEL, J.;WEBB, J.;GAGLIARDI, J.;PENDERGRASS, B.;STREIFEL, J.;BRUXVOORT, J.
分类号 B24D11/00;B24B21/00;B24B21/04;B24B37/013;B24B37/20;B24B49/04;B24B49/12;B24D7/12;B24D11/04;H01L21/304 主分类号 B24D11/00
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