发明名称 |
SCHLEIFGEGENSTAND MIT FENSTERSYSTEM SOWIE VERFAHREN ZUM POLIEREN VON WAFERN |
摘要 |
<p>A method of making an abrasive article for wafer planarization, the method comprising providing an abrasive coating composition, providing a backing having a first major surface, said surface having a first portion and a second portion, and bringing the backing into contact with the abrasive coating composition, so that the abrasive coating composition substantially adheres only to the first portion of the backing.</p> |
申请公布号 |
DE60118171(T2) |
申请公布日期 |
2007.01.25 |
申请号 |
DE2001618171T |
申请日期 |
2001.04.11 |
申请人 |
3M INNOVATIVE PROPERTIES CO. |
发明人 |
MUILENBURG, J.;KIM, YONG;FIZEL, J.;WEBB, J.;GAGLIARDI, J.;PENDERGRASS, B.;STREIFEL, J.;BRUXVOORT, J. |
分类号 |
B24D11/00;B24B21/00;B24B21/04;B24B37/013;B24B37/20;B24B49/04;B24B49/12;B24D7/12;B24D11/04;H01L21/304 |
主分类号 |
B24D11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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