PLASMA GENERATION METHOD USING AMPLITUDE MODULATION AND PLASMA GENERATION APPARATUS FOR THE SAME

摘要

A method for generating plasma using amplitude modulation is provided to prevent the inner wall of a contact hole from being over-etched by periodically exhausting reaction gas to the outside in forming the contact hole or a trench so that the reaction gas stagnates in the contact hole. The amplitude of a signal transferred from RF power(140) is modulated to generate pulse-type plasma. A signal of the RF power and a signal having a lower frequency than that of the RF power are synthesized to perform the amplitude variation. The RF power has a frequency of 10~100 mega hertz, and the frequency lower than that of the RF power is from 10 hertz to 1 mega hertz.