| 摘要 |
PROBLEM TO BE SOLVED: To improve a remote plasma cleaning method for removing undesirable deposition by-products formed on walls, surfaces, etc. of a CVD process deposition chamber and a facility from the CVD process chamber and the facility. SOLUTION: The remote cleaning method is improved by placing a free-radical initiator at the downstream of a remote plasma generator adopted for generating plasma, wherein the free-radical initiator is capable of forming a free radical in the presence of the plasma. COPYRIGHT: (C)2007,JPO&INPIT
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