A method for manufacturing a liquid crystal display is provided to improve yield and reflective efficiency of uneven patterns by using no slit mask and by reducing a photo lithography process. Insulation substrates(110) are prepared. Gate lines are formed on the insulation substrates, extended in a horizontal direction. Data lines cross the gate lines for defining pixel areas. Thin film transistors are formed at crossing areas of the gate lines and the data lines. An organic passivation film is formed on the thin film transistors. A mold having uneven patterns corresponding to the pixel areas is arranged on the organic passivation film and is pressurized to form uneven patterns on the organic passivation film. Pixel electrodes are formed on the organic passivation film.
申请公布号
KR20070010677(A)
申请公布日期
2007.01.24
申请号
KR20050065456
申请日期
2005.07.19
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
CHANG, JAE HYUK;HONG, MUN PYO;ROH, NAM SEOK;PARK, DAE JIN