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发明名称
A method for forming a pattern of a semiconductor device
摘要
申请公布号
KR100673152(B1)
申请公布日期
2007.01.22
申请号
KR20000018598
申请日期
2000.04.10
申请人
发明人
分类号
H01L21/027
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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