METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING REVERSE GATE PROCESS,申请号KR20030076032-传众专利搜索

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发明名称	METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING REVERSE GATE PROCESS
摘要
申请公布号	KR100672762(B1)	申请公布日期	2007.01.22
申请号	KR20030076032	申请日期	2003.10.29
申请人		发明人
分类号	H01L21/336;H01L21/28;H01L21/8234;H01L29/49	主分类号	H01L21/336
代理机构		代理人
主权项
地址

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