发明名称 |
COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING SAME, SILICA INSULATING FILM AND METHOD FOR FORMING SAME |
摘要 |
<p>Disclosed is a composition for forming an insulating film containing a hydrolysis-condensation product and an organic solvent which hydrolysis-condensation product is obtained through hydrolysis-condensation of a component (A), which is at least one silane compound selected from the group consisting of compounds represented by the general formulae (1)-(3) below, performed in the presence of a component (B), which is a polycarbosilane having a main chain with a structure expressed as -(Si-CH2)x- and a structure represented by the general formula (4) below, a structure represented by the general formula (5) below, a structure represented by the general formula (6) below and a structure represented by the general formula (7) below. ® KIPO & WIPO 2007</p> |
申请公布号 |
KR20070010080(A) |
申请公布日期 |
2007.01.19 |
申请号 |
KR20067025860 |
申请日期 |
2005.04.28 |
申请人 |
JSR CORPORATION |
发明人 |
AKIYAMA MASAHIRO;NAKAGAWA HISASHI;KUROSAWA TAKAHIKO;SHIOTA ATSUSHI |
分类号 |
C09D5/25;C09D183/14;B05D5/12;B05D7/24;C08G77/50;C09D7/12;C09D183/00;C09D183/02;C09D183/04;C09D183/08;C09D183/10;C09D183/16;H01B3/30;H01B3/46;H01L21/312 |
主分类号 |
C09D5/25 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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