发明名称 THIN-FILM PATTERN FORMING METHOD, SEMICONDUCTOR DEVICE, ELECTRO-OPTIC DEVICE, AND ELECTRONIC APPARATUS
摘要 A thin-film pattern forming method that deposits a plurality of thin films on a substrate to form a thin-film pattern, includes: forming a second thin film on the substrate, the second thin film having an affinity for a functional liquid containing a thin-film material that makes up a first thin film; providing lyophobic treatment that makes a surface of the second thin film repellent to the functional liquid; forming a concave portion that defines a pattern shape of the first thin film by removing part of the second thin film; discharging the functional liquid to the concave portion; and forming the first thin film by drying the functional liquid discharged to the concave portion.
申请公布号 KR100671813(B1) 申请公布日期 2007.01.19
申请号 KR20050089750 申请日期 2005.09.27
申请人 发明人
分类号 H01L29/786 主分类号 H01L29/786
代理机构 代理人
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