| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an earthing system and a mask avoiding such a problem that particles may be generated due to damage to a conductive coating by a conducting pin used for grounding a mask surface, in order to avoid errors caused by electrostatic charging during making a reflective mask for a lithographic apparatus using extreme ultraviolet radiation (EUV) and using the mask for an EUV lithographic apparatus. <P>SOLUTION: This system comprises a conductor CN connected to the earth and formed in such a manner as to make electric contact with a conductive coating 50 covering at least a part of a mask MA. This conductive coating comprises a layer comprising a metal-based compound. The conductive coating of the metal-based compound has sufficiently high conductivity, shows high hardness and high chemical stability, and possesses wear resistance. Accordingly, there are few possibilities of generating particles due to the damage to the coating by pressure applied on the conductor CN. <P>COPYRIGHT: (C)2007,JPO&INPIT |
