发明名称 POLISHING CLOTH
摘要 <P>PROBLEM TO BE SOLVED: To provide polishing cloth capable of being easily mounted on a surface plate and improving mounting workability. <P>SOLUTION: A polishing pad 1 has a polyurethane sheet 2 formed by polyurethane resin and a polyurethane sheet 6 formed by polyurethane resin. The polyurethane sheet 2 has a skin layer 2a on a mounting surface Q side to be mounted on the polishing surface plate. In the skin layer 2a, fine and precise micropores are formed. The polyurethane sheet 6 has a polishing layer usable for polishing on a polishing surface P side. A back face of the mounting surface Q of the polyurethane sheet 2 and a back face of a polishing surface P of the polyurethane sheet 6 are adhered via a both-side tape 3. By containing proper amount of water on the mounting surface Q side, surface tension of the water entering into the micropores of the skin layer 2a acts between the polishing pad 1 and the polishing surface plate. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007007824(A) 申请公布日期 2007.01.18
申请号 JP20050194683 申请日期 2005.07.04
申请人 FUJIBO HOLDINGS INC 发明人 TAKAHASHI DAISUKE;TAKAGI MASATAKA
分类号 B24B37/20;H01L21/304 主分类号 B24B37/20
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