发明名称 PATTERN MATCHING METHOD AND APPARATUS
摘要 PROBLEM TO BE SOLVED: To make a scanning electron microscope operate with high precision at high speed by reducing a process for inspection alignment, inputting work or the like. SOLUTION: The scanning electron microscope having a function specifying a desired position based on a pattern registered beforehand, comprises a means for setting information about the type of the pattern, spaces between a plurality of parts forming the pattern and the size of parts forming the pattern, and a means for forming a pattern image formed of a plurality of the parts based on information acquired by the setting means. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007012624(A) 申请公布日期 2007.01.18
申请号 JP20060188798 申请日期 2006.07.10
申请人 HITACHI LTD 发明人 YAMAGUCHI SATOSHI;IIIZUMI TAKASHI;KOMURO OSAMU;MOROKUMA HIDETOSHI;MAEDA TATSUYA;ARIMA JUNTARO;OZAWA YASUHIKO
分类号 H01J37/22;G01N23/225 主分类号 H01J37/22
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