发明名称 METHOD OF MANUFACTURING LITHOGRAPHIC APPARATUS AND DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide an immersion apparatus having an effective means of removing an immersion liquid from a surface. <P>SOLUTION: A gas knife formed to dry the surface in an immersion type lithographic apparatus is optimized to remove a liquid by establishing a pressure gradient in a liquid film on the dried surface. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007013151(A) 申请公布日期 2007.01.18
申请号 JP20060176038 申请日期 2006.06.27
申请人 ASML NETHERLANDS BV 发明人 KEMPER NICOLAAS R;LAMBERTUS DONDERS SJOERD NICOLAAS;HOOGENDAM CHRISTIAAN ALEXANDER;TEN KATE NICOLAAS;SERGEI SHULEPOV
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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