| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device and an exposure method for reliably photographing an alignment mark of a photosensitive material placed and held on a stage. <P>SOLUTION: While a stage 20 on which a photosensitive material 60 is placed and held is moved along a prescribed conveying passage, a prescribed region including an alignment mark M of the photosensitive material 60 is photographed by the first camera 36. The position of the second camera 38 specified to have a higher magnification than the first camera 36 is adjusted based on the photographing result by the first camera 36. While the stage 20 is moved along a prescribed conveying passage, the alignment mark M of the photosensitive material 60 is photographed by the second camera 38. Image data corrected based on the photographing result are exposed onto the photosensitive material 60 by an exposure means 28. <P>COPYRIGHT: (C)2007,JPO&INPIT |
