发明名称 SUBSTRATE WASHING BRUSH
摘要 PROBLEM TO BE SOLVED: To provide a self-washable substrate washing brush removing foreign matter of various sizes, and easily adjusting pressing quantity to the substrate. SOLUTION: This substrate washing brush is formed by providing channel brushes 20 formed by holding bristle-bundles with band-like long metallic fixtures, and by spirally winding several channel brushes 20 around a roller-like brush shaft 10 with equal intervals. By rotating the brush, a washing solution on the surface of the substrate is discharged along the equally intervals traces. Three channel brushes 20a, 20b, 20c are spirally wound around the brush shaft 10 with a tilted angle of 5-15°. Respective channel brushes 20 have different thicknesses (L, M, S) of bristles, being disposed in the order of getting softer stepwise from hard one discharging the washing solution without falling by the solution pressure. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007007501(A) 申请公布日期 2007.01.18
申请号 JP20050188476 申请日期 2005.06.28
申请人 SHIMADA PHYS & CHEM IND CO LTD 发明人 HAGIWARA TAKEHIRO;KATAOKA TATSUO;NARUOKA MASAAKI;SHIRAISHI SATOSHI;NAGASE AKIRA;YONEDA HISAFUMI;HORIIKE HIDEO;SUZUKI SATOSHI
分类号 B08B7/04;A46B7/10;A46B9/02;A46B13/02;B08B1/04;B08B3/04;G02F1/13;G02F1/1333;H01L21/304 主分类号 B08B7/04
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